Minutes, IBIS Quality Committee 03 August 2010 11-12 AM EST (8-9 AM PST) ROLL CALL Adam Tambone Anders Ekholm, Ericsson Barry Katz, SiSoft Benny Lazer Benjamin P Silva Bob Cox, Micron * Bob Ross, Teraspeed Consulting Group Brian Arsenault David Banas, Xilinx * Eckhard Lenski, Nokia Siemens Networks Eric Brock Guan Tao, Huawei Technologies Gregory R Edlund Hazem Hegazy Huang Chunxing, Huawei Technologies John Figueroa John Angulo, Mentor Graphics Katja Koller, Nokia Siemens Networks Kevin Fisher Kim Helliwell, LSI Logic Lance Wang, IOMethodology Lijun, Huawei Lynne Green, Green Streak Programs * Mike LaBonte, Cisco Systems Mike Mayer, SiSoft * Moshiul Haque, Micron Technology Muniswarareddy Vorugu, ARM Ltd Pavani Jella, TI Peter LaFlamme Randy Wolff, Micron Technology Radovan Vuletic, Qimonda Robert Haller, Enterasys Roy Leventhal, Leventhal Design & Communications Sherif Hammad, Mentor Graphics Tim Coyle, Signal Consulting Group Todd Westerhoff, SiSoft Tom Dagostino, Teraspeed Consulting Group Kazuyoshi Shoji, Hitachi Sadahiro Nonoyama Everyone in attendance marked by * NOTE: "AR" = Action Required. -----------------------MINUTES --------------------------- Mike LaBonte conducted the meeting. Call for opens and IBIS related patent disclosures: - No one declared a patent. AR Review: - Moshiul and Mike meet to review the correlation spec outline - Done New items: Mike showed the updated Correlation outline: - The Measurement section has been removed completely - It's elements will be discussed under Data to Correlate - Mike: FSV description might be lifted from IEEE - Bob: Overlay and envelope might be lifted from the Accuracy Handbook - Mike: This will be posted to our work archive - Mike added "Production board samples" to the test fixtures - Moshiul: Would this always be done? - Bob: We can mention it as an existing practice by some - Mike: It's daunting because there are many parts that can go wrong - The interconnect extraction could be the weak link - Bob: Randy mentioned that scaling could help - The process corner would be an unknown, so only the envelope can be checked - Both the I/V and V/T would have to be scaled - Moshiul: Ideally you would find the exact process corner - Bob: The silicon model would be adjusted to match the measured results Mike showed Randy Wolff's Nov 2008 presentation - Slides 6 & 7 show I-V curves before and after PVT adjustment - P & N sides scaled separately - Bob: Many approaches are used, we can only describe some Mike: We might want to introduce the correlation metric types before discussing "Data to correlate" in the outline - The details could be covered later - Bob: Just presenting a picture might be adequate - Mike added "Visual" to the "Types of correlation metrics" list Mike: Antonio Orlandi solved the problem using our data with FSV1D - Our data has a duplicate data point at the end - With that removed it works OK - We can look at it next time Next meeting will be August 17 Meeting ended at 12:14 PM Eastern Time.